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Effecting of oxygen and chlorine on nano-structured TiN/Si3N4 films hardness
Ma Dayan, Ma Shengli, Xu Kewei, S. VeprekVolume:
59
Year:
2005
Language:
english
Pages:
4
DOI:
10.1016/j.matlet.2004.10.062
File:
PDF, 204 KB
english, 2005