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Characteristics of nanocrystalline AlN:Er films co-deposited by using AlN, Er, and SiO2 targets
J.-W. Lim, W. Takayama, Y.F. Zhu, J.W. Bae, J.F. Wang, S.Y. Ji, K. Mimura, J.H. Yoo, M. IsshikiVolume:
61
Year:
2007
Language:
english
Pages:
6
DOI:
10.1016/j.matlet.2006.12.026
File:
PDF, 1.50 MB
english, 2007