High temperature coefficients of resistance of VO2 films...

Materials Letters 2010 Vol. 64; Iss. 17

High temperature coefficients of resistance of VO2 films grown by excimer-laser-assisted metal organic deposition process for bolometer application

Masami Nishikawa, Tomohiko Nakajima, Takaaki Manabe, Takeshi Okutani, Tetsuo Tsuchiya
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Volume:
64
Year:
2010
Language:
english
Pages:
4
DOI:
10.1016/j.matlet.2010.05.050
File:
PDF, 976 KB
english, 2010
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