Fabrication of sub-60-nm contact holes in silicon dioxide...

Microelectronic Engineering 2004 Vol. 73-74; Iss. none

Fabrication of sub-60-nm contact holes in silicon dioxide layers

Fu-Hsiang Ko, Hsin-Chiang You, Tieh-Chi Chu, Tan-Fu Lei, Chun-Chen Hsu, Hsuen-Li Chen
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Volume:
73-74
Year:
2004
Language:
english
Pages:
7
DOI:
10.1016/j.mee.2004.02.061
File:
PDF, 257 KB
english, 2004
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