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Fabrication of ultra-short T gates by a two-step electron beam lithography process
Yifang Chen, Kaiwu Peng, Zheng CuiVolume:
73-74
Year:
2004
Language:
english
Pages:
4
DOI:
10.1016/j.mee.2004.03.010
File:
PDF, 252 KB
english, 2004