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Electrical and reliability characterization of CuMn self forming barrier interconnects on low-k CDO dielectrics
Tejaswi K. Indukuri, Rohan N. Akolkar, James S. Clarke, Arda Genc, Florian Gstrein, Michael C. Harmes, Barbara Miner, Feng Xia, Daniel J. Zierath, Sridhar BalakrishnanVolume:
92
Year:
2012
Language:
english
Pages:
4
DOI:
10.1016/j.mee.2011.04.043
File:
PDF, 950 KB
english, 2012