A comprehensive study of various etch processes for the...

Microelectronic Engineering 2011 Vol. 88; Iss. 11

A comprehensive study of various etch processes for the removal of silicide-block-film in submicron CMOS technologies

Rui Li, Jun Wang, Zhenhai Sun, Yaoqi Dong, Weiran Kong, Liujiang Yu, Jun He, Xiaohua Cheng, Chingdong Wang
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Volume:
88
Year:
2011
Language:
english
Pages:
5
DOI:
10.1016/j.mee.2011.06.028
File:
PDF, 1007 KB
english, 2011
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