Minimizing variation in the electrical characteristics of...

Minimizing variation in the electrical characteristics of gate-all-around thin film transistors through the use of multiple-channel nanowire and NH3 plasma treatment

Po-Chun Huang, Lu-An Chen, Chen-Chia Chen, Jeng-Tzong Sheu
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Volume:
91
Year:
2012
Language:
english
Pages:
5
DOI:
10.1016/j.mee.2011.10.009
File:
PDF, 645 KB
english, 2012
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