Anisotropic vapor HF etching of silicon dioxide for Si...

Microelectronic Engineering 2012 Vol. 95; Iss. none

Anisotropic vapor HF etching of silicon dioxide for Si microstructure release

Vikram Passi, Ulf Sodervall, Bengt Nilsson, Goran Petersson, Mats Hagberg, Christophe Krzeminski, Emmanuel Dubois, Bert Du Bois, Jean-Pierre Raskin
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Volume:
95
Year:
2012
Language:
english
Pages:
7
DOI:
10.1016/j.mee.2012.01.005
File:
PDF, 1.45 MB
english, 2012
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