Effects of channel thickness variation on bias stress instability of InGaZnO thin-film transistors
Edward Namkyu Cho, Jung Han Kang, Ilgu YunVolume:
51
Year:
2011
Language:
english
Pages:
4
DOI:
10.1016/j.microrel.2011.07.018
File:
PDF, 667 KB
english, 2011