Study of the effect of the deposition parameters on the structural, electric and optical characteristics of polymorphous silicon films prepared by low frequency PECVD
M. Moreno, A. Torres, R. Ambrosio, C. Zuñiga, A. Torres-Rios, K. Monfil, P. Rosales, A. ItzmoyotlVolume:
176
Year:
2011
Language:
english
Pages:
5
DOI:
10.1016/j.mseb.2011.01.022
File:
PDF, 1.14 MB
english, 2011