Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
2004 Vol. 217; Iss. 1
![](/img/cover-not-exists.png)
A broad beam ion source used for planar sputter-etching of shallow layers from flat samples and determination of their mass density
A von Bohlen, H Krzyżanowska, R KlockenkämperVolume:
217
Year:
2004
Language:
english
Pages:
9
DOI:
10.1016/j.nimb.2003.09.028
File:
PDF, 440 KB
english, 2004