Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
2004 Vol. 216; Iss. none
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Diffusion simulations of boron implanted at low energy (500 eV) in crystalline silicon
L. Ihaddadene-Le Coq, J. Marcon, A. Dush-Nicolini, K. Masmoudi, K. KetataVolume:
216
Year:
2004
Language:
english
Pages:
5
DOI:
10.1016/j.nimb.2003.11.051
File:
PDF, 282 KB
english, 2004