Formation of bubbles and extended defects in He implanted...

Formation of bubbles and extended defects in He implanted (1 0 0) Si at elevated temperatures

Douglas L. da Silva, Marcio J. Mörschbächer, Paulo F.P. Fichtner, Erwan Oliviero, Moni Behar
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Volume:
219-220
Year:
2004
Language:
english
Pages:
5
DOI:
10.1016/j.nimb.2004.01.148
File:
PDF, 316 KB
english, 2004
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