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The effect of isopropyl alcohol concentration on the etching process of Si-substrates in KOH solutions
Irena Zubel, Krzysztof Rola, Małgorzata KramkowskaVolume:
171
Year:
2011
Language:
english
Pages:
10
DOI:
10.1016/j.sna.2011.09.005
File:
PDF, 2.68 MB
english, 2011