![](/img/cover-not-exists.png)
Crystalline orientation of the InN films prepared by atmospheric pressure halide chemical vapor deposition
Naoyuki Takahashi, Arei Niwa, Tadashi Takahashi, Takato NakamuraVolume:
5
Year:
2003
Language:
english
Pages:
3
DOI:
10.1016/j.solidstatesciences.2003.09.006
File:
PDF, 264 KB
english, 2003