Glass surface modification by lithography-free reactive ion...

Surface and Coatings Technology 2011 Vol. 205; Iss. supp-S2

Glass surface modification by lithography-free reactive ion etching in an Ar/CF4-plasma for controlled diffuse optical scattering

Eric Hein, Dennis Fox, Henning Fouckhardt
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Volume:
205
Year:
2011
Language:
english
Pages:
1
DOI:
10.1016/j.surfcoat.2011.03.001
File:
PDF, 916 KB
english, 2011
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