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Germanium negative-ion implantation into SiO2 layer on Si: Photoluminescence properties and oxidation state of Ge atoms in subsequent heat treatment
Hiroshi Tsuji, Nobutoshi Arai, Masashi Hattori, Masayuki Ohsaki, Yasuhito Gotoh, Junzo IshikawaVolume:
206
Year:
2011
Language:
english
Pages:
4
DOI:
10.1016/j.surfcoat.2011.04.055
File:
PDF, 216 KB
english, 2011