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Effect of nitrogen content in amorphous SiCxNyOz thin films deposited by low temperature reactive magnetron co-sputtering technique
H.S. Medeiros, R.S. Pessoa, J.C. Sagás, M.A. Fraga, L.V. Santos, H.S. Maciel, M. Massi, A.S. da Silva Sobrinho, M.E.H. Maia da CostaVolume:
206
Year:
2011
Language:
english
Pages:
9
DOI:
10.1016/j.surfcoat.2011.09.062
File:
PDF, 1.11 MB
english, 2011