A study of suppression effect of oxygen contamination by bias voltage in reactively sputtered ZrN films
A. Rizzo, M.A. Signore, D. Valerini, D. Altamura, A. Cappello, L. TapferVolume:
206
Year:
2012
Language:
english
Pages:
8
DOI:
10.1016/j.surfcoat.2011.11.034
File:
PDF, 790 KB
english, 2012