The structure and properties of CrAlN films deposited by mid-frequency unbalanced magnetron sputtering at different substrate bias duty cycles
Yanhong Lv, Li Ji, Xiaohong Liu, Hongxuan Li, Huidi Zhou, Jianmin ChenVolume:
206
Year:
2012
Language:
english
Pages:
1
DOI:
10.1016/j.surfcoat.2012.03.068
File:
PDF, 1.84 MB
english, 2012