PECVD of hydrogenated silicon thin films from SiH4+H2+Si2H6 mixtures
A. Hammad, E. Amanatides, D. Mataras, D. RapakouliasVolume:
451-452
Year:
2004
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2003.10.123
File:
PDF, 94 KB
english, 2004