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Magnetron sputtering modes during pulsed deposition process determined by the analysis of power supply parameter
K. Krówka, A. Wiatrowski, W.M. PosadowskiVolume:
520
Year:
2012
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2011.04.068
File:
PDF, 546 KB
english, 2012