Improve silane utilization for silicon thin film deposition at high rate
Shengzhi Xu, Xiaodan Zhang, Yang Li, Shaozhen Xiong, Xinhua Geng, Ying ZhaoVolume:
520
Year:
2011
Language:
english
Pages:
3
DOI:
10.1016/j.tsf.2011.06.069
File:
PDF, 307 KB
english, 2011