High rate deposition of mixed oxides by controlled reactive...

High rate deposition of mixed oxides by controlled reactive magnetron-sputtering from metallic targets

Stefan Bruns, Michael Vergöhl, Oliver Werner, Till Wallendorf
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Volume:
520
Year:
2012
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2011.07.014
File:
PDF, 562 KB
english, 2012
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