Tailoring the stress-depth profile in thin films; the case...

Thin Solid Films 2011 Vol. 520; Iss. 1

Tailoring the stress-depth profile in thin films; the case of γ’-Fe4N1-x

M. Wohlschlögel, U. Welzel, E.J. Mittemeijer
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Volume:
520
Year:
2011
Language:
english
Pages:
7
DOI:
10.1016/j.tsf.2011.07.070
File:
PDF, 546 KB
english, 2011
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