Charge trapping characteristics of Al2O3/Al-rich Al2O3/SiO2 stacked films fabricated by radio-frequency magnetron co-sputtering
Shunji Nakata, Ryoji Maeda, Takeshi Kawae, Akiharu Morimoto, Tatsuo ShimizuVolume:
520
Year:
2011
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2011.08.011
File:
PDF, 579 KB
english, 2011