Electrical activation in boron doped polycrystalline Si...

Thin Solid Films 2011 Vol. 520; Iss. 1

Electrical activation in boron doped polycrystalline Si formed by sequential lateral solidification

Won-Eui Hong, Deok Hoi Kim, Chi Woo Kim, Jae-Sang Ro
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Volume:
520
Year:
2011
Language:
english
Pages:
7
DOI:
10.1016/j.tsf.2011.08.018
File:
PDF, 873 KB
english, 2011
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