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In-situ analyses on the reactive sputtering process to deposit Al-doped ZnO films using an Al–Zn alloy target
Naoki Tsukamoto, Nobuto Oka, Yuzo ShigesatoVolume:
520
Year:
2012
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2011.08.031
File:
PDF, 812 KB
english, 2012