In-situ analyses on the reactive sputtering process to...

In-situ analyses on the reactive sputtering process to deposit Al-doped ZnO films using an Al–Zn alloy target

Naoki Tsukamoto, Nobuto Oka, Yuzo Shigesato
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
520
Year:
2012
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2011.08.031
File:
PDF, 812 KB
english, 2012
Conversion to is in progress
Conversion to is failed