Low-temperature preparation of phosphorus doped μc-Si:H...

Low-temperature preparation of phosphorus doped μc-Si:H thin films by low-frequency inductively coupled plasma assisted chemical vapor deposition

W.S. Yan, D.Y. Wei, Y.N. Guo, S. Xu, T.M. Ong, C.C. Sern
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Volume:
520
Year:
2012
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2011.08.048
File:
PDF, 1.03 MB
english, 2012
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