Low-temperature preparation of phosphorus doped μc-Si:H thin films by low-frequency inductively coupled plasma assisted chemical vapor deposition
W.S. Yan, D.Y. Wei, Y.N. Guo, S. Xu, T.M. Ong, C.C. SernVolume:
520
Year:
2012
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2011.08.048
File:
PDF, 1.03 MB
english, 2012