Interface diffusion characteristics of Al–2 at.%Nd/n + a-Si:H and Al–2 at.%Nd/n + poly-Si bilayers
Nackbong Choi, Soo-Young Yoon, Chang-Dong Kim, Miltiadis HatalisVolume:
520
Year:
2012
Language:
english
Pages:
6
DOI:
10.1016/j.tsf.2011.08.070
File:
PDF, 596 KB
english, 2012