Dielectric properties of parylene AF4 as low-k material for microelectronic applications
A. Kahouli, A. Sylvestre, F. Jomni, E. André, J.-L. Garden, B.Yangui, B. Berge, J. LegrandVolume:
520
Year:
2012
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2011.10.025
File:
PDF, 531 KB
english, 2012