Stable deposition of silicon oxynitride thin films with intermediate refractive indices by reactive sputtering
Yuki Nakanishi, Kazuhiro Kato, Hideo Omoto, Takao Tomioka, Atsushi TakamatsuVolume:
520
Year:
2012
Language:
english
Pages:
3
DOI:
10.1016/j.tsf.2011.10.052
File:
PDF, 434 KB
english, 2012