High-rate deposition of Ta-doped SnO2 films by reactive...

Thin Solid Films 2012 Vol. 520; Iss. 10

High-rate deposition of Ta-doped SnO2 films by reactive magnetron sputtering using a Sn–Ta metal-sintered target

Y. Muto, S. Nakatomi, N. Oka, Y. Iwabuchi, H. Kotsubo, Y. Shigesato
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Volume:
520
Year:
2012
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2011.10.061
File:
PDF, 863 KB
english, 2012
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