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Introducing densification mechanisms into the modelling of HfO2 atomic layer deposition
C. Mastail, C. Lanthony, S. Olivier, J.-M. Ducéré, G. Landa, A. Estève, M. Djafari Rouhani, N. Richard, A. DkhissiVolume:
520
Year:
2012
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2011.10.125
File:
PDF, 502 KB
english, 2012