Temperature-driven local rearrangement in the Er environment of Er-doped silica glass films prepared by rf-cosputtering deposition
F. Gonella, G. Battaglin, E. Cattaruzza, E. Trave, A. Leto, G. PezzottiVolume:
520
Year:
2012
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2011.10.191
File:
PDF, 710 KB
english, 2012