Dielectric oxynitride LaTiOxNy thin films deposited by...

Thin Solid Films 2012 Vol. 520; Iss. 14

Dielectric oxynitride LaTiOxNy thin films deposited by reactive radio-frequency sputtering

A. Ziani, C. Le Paven-Thivet, D. Fasquelle, L. Le Gendre, R. Benzerga, F. Tessier, F. Cheviré, J.C. Carru, A. Sharaiha
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Volume:
520
Year:
2012
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2011.10.192
File:
PDF, 751 KB
english, 2012
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