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Atomic layer deposited TiO2 for implantable brain-chip interfacing devices
E. Cianci, S. Lattanzio, G. Seguini, S.Vassanelli, M. FanciulliVolume:
520
Year:
2012
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2011.10.197
File:
PDF, 648 KB
english, 2012