Atomic layer deposited TiO2 for implantable brain-chip...

Atomic layer deposited TiO2 for implantable brain-chip interfacing devices

E. Cianci, S. Lattanzio, G. Seguini, S.Vassanelli, M. Fanciulli
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
520
Year:
2012
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2011.10.197
File:
PDF, 648 KB
english, 2012
Conversion to is in progress
Conversion to is failed