Defect generation during silicon oxidation: A Kinetic Monte...

Thin Solid Films 2012 Vol. 520; Iss. 14

Defect generation during silicon oxidation: A Kinetic Monte Carlo study

A. Ali-Messaoud, A. Chikouche, A. Estève, A. Hemeryck, C. Lanthony, C. Mastail, M. Djafari Rouhani
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Volume:
520
Year:
2012
Language:
english
Pages:
7
DOI:
10.1016/j.tsf.2011.10.207
File:
PDF, 1.51 MB
english, 2012
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