Deposition of nickel oxide by direct current reactive...

Thin Solid Films 2012 Vol. 520; Iss. 9

Deposition of nickel oxide by direct current reactive sputtering: Effect of oxygen partial pressure

A. Karpinski, A. Ferrec, M. Richard-Plouet, L. Cattin, M.A. Djouadi, L. Brohan, P.-Y. Jouan
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Volume:
520
Year:
2012
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2011.12.068
File:
PDF, 1.08 MB
english, 2012
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