Temperature dependence of SiO2 film growth with...

Thin Solid Films 2012 Vol. 520; Iss. 11

Temperature dependence of SiO2 film growth with plasma-enhanced atomic layer deposition

Akiko Kobayashi, Naoto Tsuji, Atsuki Fukazawa, Nobuyoshi Kobayashi
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Volume:
520
Year:
2012
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2012.01.037
File:
PDF, 706 KB
english, 2012
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