Low-temperature growth of Ge1 − xSnx thin...

Thin Solid Films 2012 Vol. 520; Iss. 11

Low-temperature growth of Ge1 − xSnx thin films with strain control by molecular beam epitaxy

Hai Lin, Robert Chen, Yijie Huo, Theodore I. Kamins, James S. Harris
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Volume:
520
Year:
2012
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2012.01.047
File:
PDF, 755 KB
english, 2012
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