Transient stages during the chemical vapour deposition of...

Transient stages during the chemical vapour deposition of silicon carbide from CH3SiCl3/H2: impact on the physicochemical and interfacial properties of the coatings

Georges Chollon, Francis Langlais, Maud Placide, Patrick Weisbecker
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Volume:
520
Year:
2012
Language:
english
Pages:
1
DOI:
10.1016/j.tsf.2012.05.066
File:
PDF, 2.58 MB
english, 2012
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