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Spatially varied orientation selective epitaxial growth of CeO2(100) and (110) regions on Si(100) substrates by reactive magnetron sputtering utilizing electron beam irradiation
Tomoyasu Inoue, Shigenari ShidaVolume:
520
Year:
2012
Language:
english
Pages:
1
DOI:
10.1016/j.tsf.2012.05.090
File:
PDF, 462 KB
english, 2012