Plasma parameter analysis of Ag sputter deposition using...

Vacuum 2012 Vol. 86; Iss. 10

Plasma parameter analysis of Ag sputter deposition using cathodes with different magnetic flux densities

Kazuhiro Kato, Hideo Omoto, Atsushi Takamatsu, Masaaki Yonekura
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Volume:
86
Year:
2012
Language:
english
Pages:
5
DOI:
10.1016/j.vacuum.2012.02.007
File:
PDF, 391 KB
english, 2012
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