Highly selective SiO2/Si reactive ion beam etching withlow...

Highly selective SiO2/Si reactive ion beam etching withlow energy fluorocarbon ions

E. Collard, C. Lejeune, J.P. Grandchamp, J.P. Gilles, P. Scheiblin
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
193-194
Year:
1990
Language:
english
Pages:
10
DOI:
10.1016/s0040-6090(05)80017-3
File:
PDF, 512 KB
english, 1990
Conversion to is in progress
Conversion to is failed