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Highly selective SiO2/Si reactive ion beam etching withlow energy fluorocarbon ions
E. Collard, C. Lejeune, J.P. Grandchamp, J.P. Gilles, P. ScheiblinVolume:
193-194
Year:
1990
Language:
english
Pages:
10
DOI:
10.1016/s0040-6090(05)80017-3
File:
PDF, 512 KB
english, 1990