Incorporation of OH radicals in anodic silicon oxide films...

Incorporation of OH radicals in anodic silicon oxide films studied by secondary-ion mass spectroscopy, X-ray photoelectron spectroscopy and ir analysis

I. Montero, L. Galán, E. de la Cal, J.M. Albella, J.C. Pivin
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Volume:
193-194
Year:
1990
Language:
english
Pages:
8
DOI:
10.1016/s0040-6090(05)80042-2
File:
PDF, 357 KB
english, 1990
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