Incorporation of OH radicals in anodic silicon oxide films studied by secondary-ion mass spectroscopy, X-ray photoelectron spectroscopy and ir analysis
I. Montero, L. Galán, E. de la Cal, J.M. Albella, J.C. PivinVolume:
193-194
Year:
1990
Language:
english
Pages:
8
DOI:
10.1016/s0040-6090(05)80042-2
File:
PDF, 357 KB
english, 1990