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Optimization of SiO2 film conformality in TEOS/O3 APCVD
Zheng Yuan, Simin Mokhtari, Allen Ferdinand, John Eakin, Larry BartholomewVolume:
290-291
Year:
1996
Language:
english
Pages:
5
DOI:
10.1016/s0040-6090(96)09018-9
File:
PDF, 352 KB
english, 1996