Chemical-mechanical polishing of PECVD silicon nitride

Thin Solid Films 1996 Vol. 290-291; Iss. none

Chemical-mechanical polishing of PECVD silicon nitride

Yong Zhong Hu, G.-R. Yang, T. Paul Chow, Ronald J. Gutmann
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Volume:
290-291
Year:
1996
Language:
english
Pages:
3
DOI:
10.1016/s0040-6090(96)09032-3
File:
PDF, 179 KB
english, 1996
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