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Residual stress in silicon dioxide thin films produced by ion-assisted deposition
J.Y. Robic, H. Leplan, Y. Pauleau, B. RafinVolume:
290-291
Year:
1996
Language:
english
Pages:
6
DOI:
10.1016/s0040-6090(96)09174-2
File:
PDF, 372 KB
english, 1996